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fcf95fc7 | 1 | /************************************************************************** |
2 | * Copyright(c) 1998-1999, ALICE Experiment at CERN, All rights reserved. * | |
3 | * * | |
4 | * Author: The ALICE Off-line Project. * | |
5 | * Contributors are mentioned in the code where appropriate. * | |
6 | * * | |
7 | * Permission to use, copy, modify and distribute this software and its * | |
8 | * documentation strictly for non-commercial purposes is hereby granted * | |
9 | * without fee, provided that the above copyright notice appears in all * | |
10 | * copies and that both the copyright notice and this permission notice * | |
11 | * appear in the supporting documentation. The authors make no claims * | |
12 | * about the suitability of this software for any purpose. It is * | |
13 | * provided "as is" without express or implied warranty. * | |
14 | **************************************************************************/ | |
15 | ||
16 | ||
17 | ////////////////////////////////////////////////////// | |
18 | // Calibration class for set:ITS // | |
19 | // Specific subdetector implementation is done in // | |
20 | // AliITSCalibrationSPD // | |
21 | // AliITSCalibrationSDD // | |
22 | // AliITSCalibrationSSD // | |
23 | ////////////////////////////////////////////////////// | |
24 | ||
25 | #include "Riostream.h" | |
26 | #include "AliITSCalibration.h" | |
27 | ||
28 | ClassImp(AliITSCalibration) | |
29 | ||
30 | //______________________________________________________________________ | |
4bfbde86 | 31 | AliITSCalibration::AliITSCalibration(): |
32 | TObject(), | |
33 | fDataType(), | |
34 | fdv(0.000375), | |
35 | fN(0.), | |
36 | fT(300.), | |
37 | fGeVcharge(0.), | |
38 | fResponse(){ | |
39 | // Default Constructor (300 microns and 80 volts) | |
fcf95fc7 | 40 | |
fcf95fc7 | 41 | SetGeVToCharge(); |
42 | fResponse = 0; | |
43 | } | |
44 | //______________________________________________________________________ | |
4bfbde86 | 45 | AliITSCalibration::AliITSCalibration(Double_t thickness): |
46 | TObject(), | |
47 | fDataType(), | |
48 | fdv(0.), | |
49 | fN(0.), | |
50 | fT(300.), | |
51 | fGeVcharge(0.), | |
52 | fResponse(){ | |
fcf95fc7 | 53 | // Default Constructor |
54 | ||
55 | fdv = thickness/80.0; // 80 volts. | |
fcf95fc7 | 56 | SetGeVToCharge(); |
57 | fResponse = 0; | |
58 | } | |
fcf95fc7 | 59 | |
60 | //______________________________________________________________________ | |
61 | Double_t AliITSCalibration::MobilityElectronSiEmp() const { | |
62 | // Computes the electron mobility in cm^2/volt-sec. Taken from SILVACO | |
63 | // International ATLAS II, 2D Device Simulation Framework, User Manual | |
64 | // Chapter 5 Equation 5-6. An empirical function for low-field mobiliity | |
65 | // in silicon at different tempeatures. | |
66 | // Inputs: | |
67 | // none. | |
68 | // Output: | |
69 | // none. | |
70 | // Return: | |
71 | // The Mobility of electrons in Si at a give temprature and impurity | |
72 | // concentration. [cm^2/Volt-sec] | |
73 | const Double_t km0 = 55.24; // cm^2/Volt-sec | |
74 | const Double_t km1 = 7.12E+08; // cm^2 (degree K)^2.3 / Volt-sec | |
75 | const Double_t kN0 = 1.072E17; // #/cm^3 | |
76 | const Double_t kT0 = 300.; // degree K. | |
77 | const Double_t keT0 = -2.3; // Power of Temp. | |
78 | const Double_t keT1 = -3.8; // Power of Temp. | |
79 | const Double_t keN = 0.73; // Power of Dopent Consentrations | |
80 | Double_t m; | |
81 | Double_t tT = fT,nN = fN; | |
82 | ||
83 | if(nN<=0.0){ // Simple case. | |
84 | if(tT==300.) return 1350.0; // From Table 5-1 at consentration 1.0E14. | |
85 | m = km1*TMath::Power(tT,keT0); | |
86 | return m; | |
87 | } // if nN<=0.0 | |
88 | m = km1*TMath::Power(tT,keT0) - km0; | |
89 | m /= 1.0 + TMath::Power(tT/kT0,keT1)*TMath::Power(nN/kN0,keN); | |
90 | m += km0; | |
91 | return m; | |
92 | } | |
93 | //______________________________________________________________________ | |
94 | Double_t AliITSCalibration::MobilityHoleSiEmp() const { | |
95 | // Computes the Hole mobility in cm^2/volt-sec. Taken from SILVACO | |
96 | // International ATLAS II, 2D Device Simulation Framework, User Manual | |
97 | // Chapter 5 Equation 5-7 An empirical function for low-field mobiliity | |
98 | // in silicon at different tempeatures. | |
99 | // Inputs: | |
100 | // none. | |
101 | // Output: | |
102 | // none. | |
103 | // Return: | |
104 | // The Mobility of Hole in Si at a give temprature and impurity | |
105 | // concentration. [cm^2/Volt-sec] | |
106 | const Double_t km0a = 49.74; // cm^2/Volt-sec | |
107 | const Double_t km0b = 49.70; // cm^2/Volt-sec | |
108 | const Double_t km1 = 1.35E+08; // cm^2 (degree K)^2.3 / Volt-sec | |
109 | const Double_t kN0 = 1.606E17; // #/cm^3 | |
110 | const Double_t kT0 = 300.; // degree K. | |
111 | const Double_t keT0 = -2.2; // Power of Temp. | |
112 | const Double_t keT1 = -3.7; // Power of Temp. | |
113 | const Double_t keN = 0.70; // Power of Dopent Consentrations | |
114 | Double_t m; | |
115 | Double_t tT = fT,nN = fN; | |
116 | ||
117 | if(nN<=0.0){ // Simple case. | |
118 | if(tT==300.) return 495.0; // From Table 5-1 at consentration 1.0E14. | |
119 | m = km1*TMath::Power(tT,keT0) + km0a-km0b; | |
120 | return m; | |
121 | } // if nN<=0.0 | |
122 | m = km1*TMath::Power(tT,keT0) - km0b; | |
123 | m /= 1.0 + TMath::Power(tT/kT0,keT1)*TMath::Power(nN/kN0,keN); | |
124 | m += km0a; | |
125 | return m; | |
126 | } | |
127 | //______________________________________________________________________ | |
128 | Double_t AliITSCalibration::DiffusionCoefficientElectron() const { | |
129 | // Computes the Diffusion coefficient for electrons in cm^2/sec. Taken | |
130 | // from SILVACO International ATLAS II, 2D Device Simulation Framework, | |
131 | // User Manual Chapter 5 Equation 5-53. Einstein relations for diffusion | |
132 | // coefficient. Note: 1 cm^2/sec = 10 microns^2/nanosec. | |
133 | // Inputs: | |
134 | // none. | |
135 | // Output: | |
136 | // none. | |
137 | // Return: | |
138 | // The Diffusion Coefficient of electrons in Si at a give temprature | |
139 | // and impurity concentration. [cm^2/sec] | |
140 | // const Double_t kb = 1.3806503E-23; // Joules/degree K | |
141 | // const Double_t qe = 1.60217646E-19; // Coulumbs. | |
142 | const Double_t kbqe = 8.617342312E-5; // Volt/degree K | |
143 | Double_t m = MobilityElectronSiEmp(); | |
144 | Double_t tT = fT; | |
145 | ||
146 | return m*kbqe*tT; // [cm^2/sec] | |
147 | } | |
148 | //______________________________________________________________________ | |
149 | Double_t AliITSCalibration::DiffusionCoefficientHole() const { | |
150 | // Computes the Diffusion coefficient for Holes in cm^2/sec. Taken | |
151 | // from SILVACO International ATLAS II, 2D Device Simulation Framework, | |
152 | // User Manual Chapter 5 Equation 5-53. Einstein relations for diffusion | |
153 | // coefficient. Note: 1 cm^2/sec = 10 microns^2/nanosec. | |
154 | // Inputs: | |
155 | // none. | |
156 | // Output: | |
157 | // none. | |
158 | // Return: | |
159 | // The Defusion Coefficient of Hole in Si at a give temprature and | |
160 | // impurity concentration. [cm^2/sec] | |
161 | // and impurity concentration. [cm^2/sec] | |
162 | // const Double_t kb = 1.3806503E-23; // Joules/degree K | |
163 | // const Double_t qe = 1.60217646E-19; // Coulumbs. | |
164 | const Double_t kbqe = 8.617342312E-5; // Volt/degree K | |
165 | Double_t m = MobilityHoleSiEmp(); | |
166 | Double_t tT = fT; | |
167 | ||
168 | return m*kbqe*tT; // [cm^2/sec] | |
169 | } | |
170 | //______________________________________________________________________ | |
171 | Double_t AliITSCalibration::SpeedElectron() const { | |
172 | // Computes the average speed for electrons in Si under the low-field | |
173 | // approximation. [cm/sec]. | |
174 | // Inputs: | |
175 | // none. | |
176 | // Output: | |
177 | // none. | |
178 | // Return: | |
179 | // The speed the holes are traveling at due to the low field applied. | |
180 | // [cm/sec] | |
181 | Double_t m = MobilityElectronSiEmp(); | |
182 | ||
183 | return m/fdv; // [cm/sec] | |
184 | } | |
185 | //______________________________________________________________________ | |
186 | Double_t AliITSCalibration::SpeedHole() const { | |
187 | // Computes the average speed for Holes in Si under the low-field | |
188 | // approximation.[cm/sec]. | |
189 | // Inputs: | |
190 | // none. | |
191 | // Output: | |
192 | // none. | |
193 | // Return: | |
194 | // The speed the holes are traveling at due to the low field applied. | |
195 | // [cm/sec] | |
196 | Double_t m = MobilityHoleSiEmp(); | |
197 | ||
198 | return m/fdv; // [cm/sec] | |
199 | } | |
200 | //______________________________________________________________________ | |
201 | Double_t AliITSCalibration::SigmaDiffusion3D(Double_t l) const { | |
202 | // Returns the Gaussian sigma^2 == <x^2+y^2+z^2> [cm^2] due to the | |
203 | // defusion of electrons or holes through a distance l [cm] caused | |
204 | // by an applied voltage v [volt] through a distance d [cm] in any | |
205 | // material at a temperature T [degree K]. The sigma diffusion when | |
206 | // expressed in terms of the distance over which the diffusion | |
207 | // occures, l=time/speed, is independent of the mobility and therefore | |
208 | // the properties of the material. The charge distributions is given by | |
209 | // n = exp(-r^2/4Dt)/(4piDt)^1.5. From this <r^2> = 6Dt where D=mkT/e | |
210 | // (m==mobility, k==Boltzman's constant, T==temparature, e==electric | |
211 | // charge. and vel=m*v/d. consiquently sigma^2=6kTdl/ev. | |
212 | // Inputs: | |
213 | // Double_t l Distance the charge has to travel. | |
214 | // Output: | |
215 | // none. | |
216 | // Return: | |
217 | // The Sigma due to the diffution of electrons. [cm] | |
218 | const Double_t kcon = 5.17040258E-04; // == 6k/e [J/col or volts] | |
219 | ||
220 | return TMath::Sqrt(kcon*fT*fdv*l); // [cm] | |
221 | } | |
222 | //______________________________________________________________________ | |
223 | Double_t AliITSCalibration::SigmaDiffusion2D(Double_t l) const { | |
224 | // Returns the Gaussian sigma^2 == <x^2+z^2> [cm^2] due to the defusion | |
225 | // of electrons or holes through a distance l [cm] caused by an applied | |
226 | // voltage v [volt] through a distance d [cm] in any material at a | |
227 | // temperature T [degree K]. The sigma diffusion when expressed in terms | |
228 | // of the distance over which the diffusion occures, l=time/speed, is | |
229 | // independent of the mobility and therefore the properties of the | |
230 | // material. The charge distributions is given by | |
231 | // n = exp(-r^2/4Dt)/(4piDt)^1.5. From this <x^2+z^2> = 4Dt where D=mkT/e | |
232 | // (m==mobility, k==Boltzman's constant, T==temparature, e==electric | |
233 | // charge. and vel=m*v/d. consiquently sigma^2=4kTdl/ev. | |
234 | // Inputs: | |
235 | // Double_t l Distance the charge has to travel. | |
236 | // Output: | |
237 | // none. | |
238 | // Return: | |
239 | // The Sigma due to the diffution of electrons. [cm] | |
240 | const Double_t kcon = 3.446935053E-04; // == 4k/e [J/col or volts] | |
241 | ||
242 | return TMath::Sqrt(kcon*fT*fdv*l); // [cm] | |
243 | } | |
244 | //______________________________________________________________________ | |
245 | Double_t AliITSCalibration::SigmaDiffusion1D(Double_t l) const { | |
246 | // Returns the Gaussian sigma^2 == <x^2> [cm^2] due to the defusion | |
247 | // of electrons or holes through a distance l [cm] caused by an applied | |
248 | // voltage v [volt] through a distance d [cm] in any material at a | |
249 | // temperature T [degree K]. The sigma diffusion when expressed in terms | |
250 | // of the distance over which the diffusion occures, l=time/speed, is | |
251 | // independent of the mobility and therefore the properties of the | |
252 | // material. The charge distributions is given by | |
253 | // n = exp(-r^2/4Dt)/(4piDt)^1.5. From this <r^2> = 2Dt where D=mkT/e | |
254 | // (m==mobility, k==Boltzman's constant, T==temparature, e==electric | |
255 | // charge. and vel=m*v/d. consiquently sigma^2=2kTdl/ev. | |
256 | // Inputs: | |
257 | // Double_t l Distance the charge has to travel. | |
258 | // Output: | |
259 | // none. | |
260 | // Return: | |
261 | // The Sigma due to the diffution of electrons. [cm] | |
262 | const Double_t kcon = 1.723467527E-04; // == 2k/e [J/col or volts] | |
263 | ||
264 | return TMath::Sqrt(kcon*fT*fdv*l); // [cm] | |
265 | } | |
266 | //---------------------------------------------------------------------- | |
267 | Double_t AliITSCalibration::DepletedRegionThicknessA(Double_t dopCons, | |
268 | Double_t voltage, | |
269 | Double_t elecCharge, | |
270 | Double_t voltBuiltIn)const{ | |
271 | // Computes the thickness of the depleted region in Si due to the | |
272 | // application of an external bias voltage. From the Particle Data | |
273 | // Book, 28.8 Silicon semiconductor detectors equation 28.19 (2004) | |
274 | // Physics Letters B "Review of Particle Physics" Volume 592, Issue 1-4 | |
275 | // July 15 2004, ISSN 0370-2693 page 263. First equation. | |
276 | // Inputs: | |
277 | // Double_t dopCons "N" doping concentration | |
278 | // Double_t voltage "V" external bias voltage | |
279 | // Double_t elecCharge "e" electronic charge | |
280 | // Double_t voltBuiltIn=0.5 "V_bi" "built-in" Voltage (~0.5V for | |
281 | // resistivities typically used in detectors) | |
282 | // Output: | |
283 | // none. | |
284 | // Return: | |
285 | // The thickness of the depleted region | |
286 | ||
287 | return TMath::Sqrt(2.0*(voltage+voltBuiltIn)/(dopCons*elecCharge)); | |
288 | } | |
289 | //---------------------------------------------------------------------- | |
290 | Double_t AliITSCalibration::DepletedRegionThicknessB(Double_t resist, | |
291 | Double_t voltage, | |
292 | Double_t mobility, | |
293 | Double_t voltBuiltIn, | |
294 | Double_t dielConst)const{ | |
295 | // Computes the thickness of the depleted region in Si due to the | |
296 | // application of an external bias voltage. From the Particle Data | |
297 | // Book, 28.8 Silicon semiconductor detectors equation 28.19 (2004) | |
298 | // Physics Letters B "Review of Particle Physics" Volume 592, Issue 1-4 | |
299 | // July 15 2004, ISSN 0370-2693 page 263. Second Equation. | |
300 | // Inputs: | |
301 | // Double_t resist "rho" resistivity (typically 1-10 kOhm cm) | |
302 | // Double_t voltage "V" external bias voltage | |
303 | // Double_t mobility "mu" charge carrier mobility | |
304 | // (electons 1350, holes 450 cm^2/V/s) | |
305 | // Double_t voltBuiltIn=0.5 "V_bi" "built-in" Voltage (~0.5V for | |
306 | // resistivities typically used in detectors) | |
307 | // Double_t dielConst=1.E-12 "epsilon" dielectric constant = 11.9 * | |
308 | // (permittivity of free space) or ~ 1 pF/cm | |
309 | // Output: | |
310 | // none. | |
311 | // Return: | |
312 | // The thickness of the depleted region | |
313 | ||
314 | return TMath::Sqrt(2.8*resist*mobility*dielConst*(voltage+voltBuiltIn)); | |
315 | } | |
316 | //---------------------------------------------------------------------- | |
317 | Double_t AliITSCalibration::ReverseBiasCurrent(Double_t temp, | |
318 | Double_t revBiasCurT1, | |
319 | Double_t tempT1, | |
320 | Double_t energy)const{ | |
321 | // Computes the temperature dependance of the reverse bias current | |
322 | // of Si detectors. From the Particle Data | |
323 | // Book, 28.8 Silicon semiconductor detectors equation 28.21 (2004) | |
324 | // Physics Letters B "Review of Particle Physics" Volume 592, Issue 1-4 | |
325 | // July 15 2004, ISSN 0370-2693 page 263. | |
326 | // Inputs: | |
327 | // Double_t temp The temperature at which the current is wanted | |
328 | // Double_t revBiasCurT1 The reference bias current at temp T1 | |
329 | // Double_t tempT1 The temperature correstponding to revBiasCurT1 | |
330 | // Double_t energy=1.2 Some energy [eV] | |
331 | // Output: | |
332 | // none. | |
333 | // Return: | |
334 | // The reverse bias current at the tempeature temp. | |
335 | const Double_t kBoltz = 8.617343E-5; //[eV/K] | |
336 | ||
337 | return revBiasCurT1*(temp*temp/(tempT1*tempT1))* | |
338 | TMath::Exp(-0.5*energy*(tempT1-temp)/(kBoltz*tempT1*temp)); | |
339 | } | |
340 | //---------------------------------------------------------------------- | |
341 | void AliITSCalibration::Print(ostream *os) const { | |
342 | // Standard output format for this class. | |
343 | // Inputs: | |
344 | *os << fdv << " " << fN << " " << fT << " "; | |
345 | *os << fGeVcharge; | |
346 | // printf("%-10.6e %-10.6e %-10.6e %-10.6e \n",fdv,fN,fT,fGeVcharge); | |
347 | return; | |
348 | } | |
349 | //---------------------------------------------------------------------- | |
350 | void AliITSCalibration::Read(istream *is) { | |
351 | // Standard input format for this class. | |
352 | // Inputs: | |
353 | // ostream *is Pointer to the output stream | |
354 | // Outputs: | |
355 | // none: | |
356 | // Return: | |
357 | // none. | |
358 | ||
359 | *is >> fdv >> fN >> fT >> fGeVcharge; | |
360 | return; | |
361 | } | |
362 | //---------------------------------------------------------------------- | |
363 | ||
364 | ostream &operator<<(ostream &os,AliITSCalibration &p){ | |
365 | // Standard output streaming function. | |
366 | // Inputs: | |
367 | // ostream *os Pointer to the output stream | |
368 | // Outputs: | |
369 | // none: | |
370 | // Return: | |
371 | // none. | |
372 | ||
373 | p.Print(&os); | |
374 | return os; | |
375 | } | |
376 | ||
377 | //---------------------------------------------------------------------- | |
378 | istream &operator>>(istream &is,AliITSCalibration &r){ | |
379 | // Standard input streaming function. | |
380 | // Inputs: | |
381 | // ostream *os Pointer to the output stream | |
382 | // Outputs: | |
383 | // none: | |
384 | // Return: | |
385 | // none. | |
386 | ||
387 | r.Read(&is); | |
388 | return is; | |
389 | } | |
390 | //---------------------------------------------------------------------- |