//
// Configuration methods
//
-
- // Set GeVcharge value (Default value is based on about 20,000 e- by a
- // mip (1.163E-4GeV) in 300 microns)
- virtual void SetGeVToCharge(Double_t gc=1.719E+8){fGeVcharge = gc;}
+ // fGeVcharge is set by default 3.6e-9 GeV See for ex. PDG 2004.
+ virtual void SetGeVToCharge(Double_t gc=3.6e-9){fGeVcharge = gc;}
// Returns the value fGeVcharge
virtual Double_t GetGeVToCharge() const {return fGeVcharge;}
// Converts deposited energy to number of electrons liberated
- virtual Double_t GeVToCharge(Double_t gev) const {return gev*fGeVcharge;}
-
+ virtual Double_t GeVToCharge(Double_t gev) const {return gev/fGeVcharge;}
// Diffusion coefficient
virtual void SetDiffCoeff(Double_t, Double_t) = 0;
// Get diffusion coefficients
// electrons or holes through a distance l [cm] caused by an applied
// voltage v [volt] through a distance d [cm] in any material at a
// temperature T [degree K].
- virtual Double_t SigmaDiffusion3D(Double_t l) const ;
+ virtual Double_t SigmaDiffusion3D(Double_t l) const;
// Returns the Gaussian sigma == <x^2 +y^2+z^2> [cm^2] due to the
// defusion of electrons or holes through a distance l [cm] caused by an
// applied voltage v [volt] through a distance d [cm] in any material at a
// temperature T [degree K].
- virtual Double_t SigmaDiffusion2D(Double_t l) const ;
+ virtual Double_t SigmaDiffusion2D(Double_t l) const;
// Returns the Gaussian sigma == <x^2+z^2> [cm^2] due to the defusion of
// electrons or holes through a distance l [cm] caused by an applied
// voltage v [volt] through a distance d [cm] in any material at a
// temperature T [degree K].
- virtual Double_t SigmaDiffusion1D(Double_t l) const ;
+ virtual Double_t SigmaDiffusion1D(Double_t l) const;
+ // Compute the thickness of the depleted region in a Si detector, version A
+ virtual Double_t DepletedRegionThicknessA(Double_t dopCons,
+ Double_t voltage,
+ Double_t elecCharge,
+ Double_t voltBuiltIn=0.5)const;
+ // Compute the thickness of the depleted region in a Si detector, version B
+ virtual Double_t DepletedRegionThicknessB(Double_t resist,Double_t voltage,
+ Double_t mobility,
+ Double_t voltBuiltIn=0.5,
+ Double_t dielConst=1.E-12)const;
+ // Computes the temperature dependance of the reverse bias current
+ virtual Double_t ReverseBiasCurrent(Double_t temp,Double_t revBiasCurT1,
+ Double_t tempT1,Double_t energy=1.2)const;
// Prints out the content of this class in ASCII format.
virtual void Print(ostream *os) const;
// Reads in the content of this class in the format of Print
virtual void Read(istream *is);
+ virtual void Print(Option_t *option="") const {TObject::Print(option);}
+ virtual Int_t Read(const char *name) {return TObject::Read(name);}
protected:
void NotImplemented(const char *method) const {if(gDebug>0)
Warning(method,"This method is not implemented for this sub-class");}
// the potential v is applied d/v [cm/volts]
Double_t fN; // the impurity consentration of the material in #/cm^3
Double_t fT; // The temperature of the Si in Degree K.
- Double_t fGeVcharge; // Energy to ionize (free an electron).
+ Double_t fGeVcharge; // Energy to ionize (free an electron) in GeV
TString fFileName1; // input keys : run, module #
TString fFileName2; // baseline & noise val or output code
// signal or monitored bgr.
TString fFileName3; // param values or output coded signal
Bool_t fWrite; // Write option for the compression algorithms
- ClassDef(AliITSresponse,2) // Detector type response virtual base class
+ ClassDef(AliITSresponse,3) // Detector type response virtual base class
};
// Input and output function for standard C++ input/output.
ostream& operator<<(ostream &os,AliITSresponse &source);